- All sections
- C - Chemistry; metallurgy
- C10M - Lubricating compositions; use of chemical substances either alone or as lubricating ingredients in a lubricating composition
- C10M 105/54 - Lubricating compositions characterised by the base-material being a non-macromolecular organic compound containing halogen containing carbon, hydrogen, halogen and oxygen
Patent holdings for IPC class C10M 105/54
Total number of patents in this class: 117
10-year publication summary
|
10
|
6
|
13
|
9
|
6
|
10
|
10
|
8
|
11
|
3
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Showa Denko K.K. | 2539 |
22 |
| Resonac Corporation | 2233 |
20 |
| Moresco Corporation | 151 |
16 |
| NOK Kluber Co., Ltd. | 54 |
8 |
| E. I. du Pont de Nemours and Company | 4345 |
5 |
| Dexerials Corporation | 1826 |
4 |
| Mexichem Fluor, Sociedad Anonima de Capital Variable | 200 |
4 |
| WD Media (Singapore) Pte. Ltd. | 28 |
4 |
| Asahi Glass Company, Limited | 2985 |
3 |
| Western Digital Technologies, Inc. | 1043 |
3 |
| President and Fellows of Harvard College | 5792 |
3 |
| Solvay Specialty Polymers Italy S.p.A. | 704 |
3 |
| Total Marketing Services | 487 |
3 |
| FUJIFILM Corporation | 27102 |
2 |
| Seagate Technology LLC | 4228 |
2 |
| JPMorgan Chase Bank, National Association | 10964 |
2 |
| 3m Innovative Properties Company | 18406 |
1 |
| Fujitsu Limited | 19265 |
1 |
| Hoya Corporation | 2822 |
1 |
| Fuji Electric Co., Ltd. | 4750 |
1 |
| Other owners | 9 |